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Solvent-resistant ultrafine nonwoven fibrous membranes by ultraviolet-assisted electrospinning of organo-soluble photosensitive polyimide resin

机译:有机溶性光敏聚酰亚胺树脂紫外线辅助静电纺丝耐溶剂超细无纺布纤维纺丝

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摘要

An ultraviolet-assisted electrospinning (UVAES) method was investigated to improve the solvent stability of soluble polyimide (PI) electrospun ultrafine fibrous membranes (UFMs) to assist in the development of fibrous polymeric materials with improved resistance to harsh environmental conditions and to expand the potential applications for such soft filaments. A preimidized soluble negative photosensitive polyimide (PSPI) was synthesized via an one-step thermal polycondensation from 3,3 ',4,4 '-benzophenonetetracarboxylic dianhydride (BTDA) and 1,1 '-bis(4-amino-3,5-dimethylphenyl)-1-(3 '-trifluoromethylphenyl)methane (TFMDA). The PI resin was then fabricated into UFMs by both conventional electrospinning (ES) and UVAES withN,N-dimethylacetamide (DMAc) as the solvent. During spinning, photo crosslinking reaction occurred, accompanied by simultaneous micro-jets of PI-UV ultrafine fibers in the UVAES procedure. This created fibers that were thermally stable at higher than 500 degrees C, reflection over 77% of the 457-nm- wavelength light, whiteness index (WI) higher than 83, and enhanced solvent resistance in DMAc. Generally speaking, compared with the PI UFMs fabricated by conventional ES procedure, the PI-UV UFMs obtained by the newly-developed UVAES procedure showed much superior solvent resistance, comparable thermal stability, slightly decreased optical reflectance and WI values, and reduced fiber diameters. These properties are of great value to future applications in microelectronics and wearable technology.
机译:研究了一种紫外辅助静电纺丝(UVAES)方法,以提高可溶性聚酰亚胺(PI)静电纺丝超细纤维膜(UFM)的溶剂稳定性,从而有助于开发具有更高抗恶劣环境条件的纤维聚合物材料,并扩展此类软纤维的潜在应用。以3,3',4,4'-二苯甲酮四羧酸二酐(BTDA)和1,1'-双(4-氨基-3,5-二甲基苯基)-1-(3'-三氟甲基苯基)甲烷(TFMDA)为原料,通过一步热缩聚反应合成了预亚胺化的可溶性负光敏聚酰亚胺(PSPI)。然后以N,N-二甲基乙酰胺(DMAc)为溶剂,通过常规静电纺丝(ES)和UVAES将PI树脂制成UFM。在纺丝过程中,发生了光交联反应,同时伴随着UVAES过程中PI-UV超细纤维的微射流。这使得纤维在高于500摄氏度的温度下保持热稳定性,在457nm波长的光中反射超过77%,白度指数(WI)高于83,增强了DMAc的耐溶剂性。总的来说,与传统ES工艺制备的PI-UV UFM相比,新开发的UVAES工艺制备的PI-UV UFM具有更好的耐溶剂性、相当的热稳定性、略微降低的光学反射率和WI值,以及减小的光纤直径。这些特性对未来微电子和可穿戴技术的应用具有重要价值。

著录项

  • 来源
    《Journal of Applied Polymer Science》 |2021年第12期|共10页
  • 作者单位

    China Univ Geosci Sch Mat Sci &

    Technol Beijing Key Lab Mat Utilizat Nonmetall Minerals &

    Natl Lab Mineral Mat Beijing 100083 Peoples R China;

    China Univ Geosci Sch Mat Sci &

    Technol Beijing Key Lab Mat Utilizat Nonmetall Minerals &

    Natl Lab Mineral Mat Beijing 100083 Peoples R China;

    Commercial Aircraft Corp China Ltd Composite Ctr Shanghai Peoples R China;

    China Univ Geosci Sch Mat Sci &

    Technol Beijing Key Lab Mat Utilizat Nonmetall Minerals &

    Natl Lab Mineral Mat Beijing 100083 Peoples R China;

    China Univ Geosci Sch Mat Sci &

    Technol Beijing Key Lab Mat Utilizat Nonmetall Minerals &

    Natl Lab Mineral Mat Beijing 100083 Peoples R China;

    China Univ Geosci Sch Mat Sci &

    Technol Beijing Key Lab Mat Utilizat Nonmetall Minerals &

    Natl Lab Mineral Mat Beijing 100083 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 高分子化合物工业(高聚物工业);
  • 关键词

    fibers; electrospinning; membranes; photopolymerization; thermal properties;

    机译:纤维;静电纺丝;膜;光聚合;热性质;

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