Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

Chen Guodong; Zheng Jinlun; Wang Zhengwei; Zhang Kui; Mo Zhichang; Liu Xing; Gao Tianyu; Wang Yang; Wei Jingsong

首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

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Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

机译：通过硫属化物热模抗胰蛋白酶制备光学玻璃上的微/纳米多功能图案

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Heat-mode resists can spatially confine the laser hot spot to achieve subwavelength exposure by laser direct writing. However, due to the lack of systematic research on the dry etching mechanism of them, micro/nano patterning on optical glass materials through heat-mode resists has not been realized with standardized plasma processes. In this paper, the fabrication of sub-wavelength micro/nanostructures on silica substrates through the heat-mode resist is reported. A chalcogenide alloy AgInSbTe (AIST) works as the heat-mode resist. The anti-etching mechanism of the AIST resist in fluorine-based plasma gas was explored with the Xray photoelectron spectroscopy. High etching selectivity, surface quality, and fidelity are achieved by optimizing the plasma-etching processes. Experimental and theoretical results confirm the effectiveness and feasibility of this technology. A series of micro/nano-pattern structures on silica are prepared, where the minimum feature size is 130 nm, which is about 1/3 the laser wavelength. This work paves an effective and convenient way for the fabrication of subwavelength optical elements on transparent glass substrates. (C) 2021 Elsevier B.V. All rights reserved.

机译：热模式电阻可以在空间上限制激光热点，通过激光直接写入实现亚波长曝光。然而，由于缺乏对其干法刻蚀机理的系统研究，还没有通过标准化的等离子体工艺在光学玻璃材料上实现通过热模式电阻的微/纳米图案化。本文报道了通过热模抗蚀剂在二氧化硅衬底上制备亚波长微/纳米结构的方法。硫系合金AgInSbTe（AIST）用作热模式电阻。利用X射线光电子能谱研究了AIST抗蚀剂在氟基等离子体气体中的抗蚀机理。通过优化等离子体刻蚀工艺，实现了高的刻蚀选择性、表面质量和保真度。实验和理论结果证实了该技术的有效性和可行性。在二氧化硅上制备了一系列微纳图形结构，其最小特征尺寸为130nm，约为激光波长的1/3。这项工作为在透明玻璃衬底上制备亚波长光学元件提供了一种有效且方便的方法。（c）2021爱思唯尔B.V.保留所有权利。

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来源
《Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics》 |2021年第1期|共7页
作者
Chen Guodong; Zheng Jinlun; Wang Zhengwei; Zhang Kui; Mo Zhichang; Liu Xing; Gao Tianyu; Wang Yang; Wei Jingsong;
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作者单位

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Lab Micronano Optoelect Mat &

Devices Shanghai 201800 Peoples R China;

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原文格式 PDF
正文语种 eng
中图分类合金学与各种性质合金;金属材料;
关键词
Chalcogenide heat-mode resist; Sub-wavelength optical element; Pattern transfer; AgInSbTe; Silica;

机译：硫属化物热模式抗蚀剂;子波长光学元件;图案转移;aginsbte;二氧化硅;

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Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

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