Effect of Substrate Temperature on the Growth of Molybdenum Trioxide Thin Films

Divya Dixit; Madhuri K. V.

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Effect of Substrate Temperature on the Growth of Molybdenum Trioxide Thin Films

机译：基材温度对三氧化钼薄膜生长的影响

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Molybdenum oxide is one of the most important inorganic material, which exhibits several phases, such as MoO3, MoO2, Mo4O11, Mo5O14, etc. Among them, molybdenum trioxide (MoO3) can crystallize in various phases, such as orthorhombic, monoclinic etc., which makes it useful for possible applications in chemical, electrical and electrochemical industries. In this work, MoO(3)films were obtained by pulsed laser deposition by varying the substrate temperature from room temperature to 400 degrees C. The thin films were deposited on fine cleaned glass substrates coated with fluorine tin oxide under a pressure of 10(-5)mbar. X-ray diffraction patterns display two polymorphic phases of MoO3(alpha and beta), but no other phases are observed, and the structure changes from orthorhombic to monoclinic. The substrate temperature strongly influences the structure and surface topography. Morphological studies show the surface homogeneity, crack-free, layered structure and crystallinity of the films. The band gap of the obtained MoO(3)thin films increases from 3.0 to 3.39 eV with increasing substrate temperature from room temperature to 400 degrees C.

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《Crystallography reports》 |2020年第5期|共6页
作者
Divya Dixit; Madhuri K. V.;
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作者单位

Deemed Univ Vignans Fdn Sci Technol &

Res Dept Sci &

Humanities Div Phys Thin Film Res Lab Guntur 522213 Andhra Pradesh India;

Deemed Univ Vignans Fdn Sci Technol &

Res Dept Sci &

Humanities Div Phys Thin Film Res Lab Guntur 522213 Andhra Pradesh India;

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正文语种 eng
中图分类晶体学;
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Effect of Substrate Temperature on the Growth of Molybdenum Trioxide Thin Films

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