Influence of ion-induced secondary electron emission parameters in PICMC plasma simulations with experimental validation in DC cylindrical diode and magnetron discharges

T Richard; I Furno; A Sublet; M Taborelli

首页> 外文期刊>Plasma Sources Science & Technology >Influence of ion-induced secondary electron emission parameters in PICMC plasma simulations with experimental validation in DC cylindrical diode and magnetron discharges

【24h】

Influence of ion-induced secondary electron emission parameters in PICMC plasma simulations with experimental validation in DC cylindrical diode and magnetron discharges

机译：DC圆柱二极管二极管和磁控辐射实验验证的PICMC等离子体模拟中离子诱导的二次电子发射参数的影响

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Niobium thin films are used at CERN (European Organization for Nuclear Research) for coatings of superconducting radio-frequency (SRF) accelerating cavities. Numerical simulations can help to better understand the physical processes involved in such coatings and provide predictions of thin film properties. In this article, particle-in-cellMonte Carlo 3D plasma simulations are validated against experimental data in a coaxial cylindrical system allowing both DC diode and DC magnetron operation. A proper choice of ion induced secondary electron emission parameters enables to match experimental and simulated discharge currents and voltages, with argon as the process gas and niobium as the target element. Langmuir probe measurements are presented to further support simulation results. The choice of argon gas with a niobium target is driven by CERN applications, but the methodology described in this paper is applicable to other discharge gases and target elements.Validation of plasma simulations is the first step towards developing an accurate methodology for predicting thin film coatings characteristics in complex objects such as SRF cavities.

机译：铌薄膜被欧洲核研究组织（CERN）用于超导射频（SRF）加速腔的涂层。数值模拟有助于更好地理解此类涂层中涉及的物理过程，并提供薄膜性能的预测。在这篇文章中，粒子在细胞蒙特卡罗三维等离子体模拟验证了同轴圆柱系统中的实验数据，允许直流二极管和直流磁控管操作。选择合适的离子诱导二次电子发射参数可以匹配实验和模拟的放电电流和电压，以氩为工艺气体，铌为目标元素。Langmuir探针测量结果进一步支持了模拟结果。选择带有铌靶的氩气取决于CERN的应用，但本文所述方法适用于其他放电气体和靶元件。等离子体模拟的验证是开发一种精确的方法来预测复杂物体（如SRF腔）中薄膜涂层特性的第一步。

著录项

来源
《Plasma Sources Science & Technology》 |2020年第9期|共11页
作者
T Richard; I Furno; A Sublet; M Taborelli;
展开▼
作者单位

CERN European Organization for Nuclear Research 1211 Geneva 23 Switzerland;

Ecole Polytechnique Fédérale de Lausanne (EPFL) Swiss Plasma Center CH-1015 Lausanne Switzerland;

CERN European Organization for Nuclear Research 1211 Geneva 23 Switzerland;

CERN European Organization for Nuclear Research 1211 Geneva 23 Switzerland;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类等离子体物理学;
关键词
particle-in-cell Monte Carlo; plasma simulation; ion-induced secondary electron emission; Langmuir probe;

机译：粒子内蒙特卡罗;等离子体仿真;离子诱导的二次电子发射;Langmuir探头;

相似文献

外文文献
专利

1. Feedback model of secondary electron emission in DC gas discharge plasmas [J] . Saravanan ARUMUGAM, Prince ALEX, Suraj Kumar SINHA 等离子体科学和技术（英文版） . 2018,第002期
2. Simulation of Secondary Electron and Backscattered Electron Emission in A6 Relativistic Magnetron Driven by Different Cathode [J] . LIU Meiqin, LI Bolun, LIU Chunliang, 等离子体科学和技术（英文版） . 2015,第001期
3. Effect of E× B electron drift and plasma discharge in dc magnetron sputtering plasma [J] . Sankar Moni Borah, Arup Ratan Pal, Heremba Bailung, 中国物理：英文版 . 2011,第001期
4. Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma [J] . Sankar Moni Borah, Arup Ratan Pal, Heremba Bailung, 中国物理：英文版 . 2011,第001期
5. Numerical study on discharge characteristics influenced by secondary electron emission in capacitive RF argon glow discharges by fluid modeling [J] . Lu-Lu Zhao, Yue Liu, Tagra Samir 中国物理：英文版 . 2018,第002期
6. Characteristics of a micro dielectric barrier discharge ignited by a cold cathode with high ion-induced secondary electron emission for plasma display panel [J] . Giichiro Uchida, Satoshi Uchida, Hiroshi Kajiyama, Journal of Applied Physics . 2009,第9期

机译：等离子显示面板由高离子感生二次电子发射的冷阴极点燃的微介电势垒放电的特性
7. The effects of secondary electron emission on plasma sheath characteristics and electron transport in an E B discharge via kinetic simulations [J] . Antoine Tavant, Vivien Croes, Romain Lucken, Plasma Sources Science & Technology . 2018,第12期

机译：通过动力学模拟在E B放电中等离子体鞘特性和电子传输的二次电子发射的影响
8. 2-D experimental study of the plasma parameter variations or the magnetically sustained DC discharge in cylindrical symmetry in argon [J] . Holik N, Bilyk O, Marek A, Contributions to Plasma Physics . 2004,第7a8期

机译：氩气中圆柱对称性等离子体参数变化或磁持续直流放电的二维实验研究
9. Measurement of ion-induced secondary electron emission coefficient for MgO thin film with plasma treatment [C] . Jeong H.S., Oh J.S., Lim J.Y., IEEE International Vacuum Electronics Conference . 2003

机译：具有等离子体处理的MgO薄膜离子诱导的二次电子发射系数的测量
10. Characteristics of reactive discharge in DC magnetron plasma. [D] . Borah, Sankar Moni. 2009

机译：直流磁控管等离子体中的无功放电特性。
11. Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films [O] . Jie Li, Xingkang Yi, Wenbo Hu, 2019

机译：磁控溅射沉积非晶碳膜的基体温度相关的微观结构和电子诱导的二次电子发射特性
12. Characteristics of a micro dielectric barrier discharge ignited by a cold cathode with high ion-induced secondary electron emission for plasma display panel [O] . Giichiro Uchida, Satoshi Uchida, Hiroshi Kajiyama, 2009

机译：具有高离子诱导的等离子体显示板的冷阴极点燃的微介质屏障放电的特性
13. Procedures for Including Secondary Electron Emission in Numerical Simulations of Plasma-Insulator Interactions [R] . Beyst, Brian, Rezvani, Ali, Young, Bin, 1991

机译：等离子体 - 绝缘子相互作用数值模拟中包含二次电子发射的程序

Influence of ion-induced secondary electron emission parameters in PICMC plasma simulations with experimental validation in DC cylindrical diode and magnetron discharges

摘要

著录项

相似文献

相关主题

期刊订阅