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首页> 外文期刊>Journal of Micromechanics and Microengineering >Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography
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Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography

机译:通过降低软光刻中的界面粘附来制备高纵横比聚二甲基硅氧烷微观结构

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摘要

The soft lithographic fabrication of high-aspect-ratio polydimethylsiloxane (PDMS) microstructures is quite challenging because of the strong interfacial adhesion between them and masters during demolding. This paper presents a simple method for fabricating high-aspect-ratio PDMS microstructures by reducing the interfacial adhesion through the cooling process. The effect of cooling process on the topography, elastic property, and adhesion property of Sylgard 184 PDMS is studied. It is found that wrinkles are formed on the surface of PDMS and that the Young's modulus of PDMS is increased by the air cooling process. Consequently, the air-cooled PDMS has lower adhesion than the traditional oven-cooled PDMS. This result could be explained by the adhesion parameter theory: both the high amplitude of the wrinkles formed on the surface of PDMS and the high Young's modulus of PDMS increase separation forces and reduce adhesive forces in the interface. Application of this method is demonstrated by fabricating PDMS microchannels from a silicon master which has microstructures with different aspect ratios. Compared with PDMS microchannels obtained by the oven cooling process, PDMS microchannels with a depth of 200 mu m and an aspect ratio of 10 are successfully fabricated by the air cooling process.
机译:由于高长径比聚二甲基硅氧烷(PDMS)微结构在脱模过程中与母材之间具有很强的界面粘合性,因此其软光刻制造具有很大的挑战性。本文提出了一种通过冷却过程降低界面附着力来制备高深宽比PDMS微结构的简单方法。研究了冷却工艺对Sylgard 184 PDMS的形貌、弹性和粘接性能的影响。研究发现,空气冷却过程中,PDMS表面会形成褶皱,并且PDMS的杨氏模量会增加。因此,与传统的烘箱冷却PDM相比,风冷PDM具有更低的附着力。这一结果可以用粘附参数理论来解释:在PDMS表面形成的褶皱的高振幅和PDMS的高杨氏模量都会增加分离力并降低界面中的粘附力。该方法的应用通过从具有不同长宽比的微结构的硅母材制造PDMS微通道来证明。与烘箱冷却工艺获得的PDMS微通道相比,采用空气冷却工艺成功制备出深度为200μm、宽高比为10的PDMS微通道。

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