...
首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >Effect of Contamination on a Test Object for SEM Calibration
【24h】

Effect of Contamination on a Test Object for SEM Calibration

机译:污染对SEM校准测试对象的影响

获取原文
获取原文并翻译 | 示例
           

摘要

The effect of contamination on the relief of an MShPS-2.0Si test object for the calibration of a scanning electron microscope (SEM) is studied. The test object is grooves with a trapezoidal profile and large inclination angles of the side walls on the surface of silicon. It is shown that the largest distortions of the structure in the presence of contamination take place in regions adjacent to the region of scanning with an electron probe. The distortions in these regions are so large that these regions cannot be used for SEM calibration. The sizes of these regions reach 20 mu m in the lengthwise direction along the grooves and 8 mu m across when primary electrons with an energy of 15 keV are used for scanning. The region of scanning with an electron probe has small distortions, which allows one to use this region for SEM calibration. When using primary electrons with an energy of 15 keV and a probe current of 0.2 nA, the size of projections of the lateral inclined walls of the grooves does not change within seven scans. This allows one to use an MShPS-2.0Si test object up to a thousand times for SEM calibration (up to seven times in one spot).
机译:研究了用于扫描电子显微镜(SEM)校准的MShPS-2.0Si试件的污染对浮雕的影响。测试对象是硅表面上具有梯形轮廓和侧壁大倾角的凹槽。结果表明,在存在污染的情况下,结构的最大变形发生在与电子探针扫描区域相邻的区域。这些区域的畸变非常大,以至于这些区域无法用于SEM校准。当使用能量为15kev的初级电子进行扫描时,这些区域的尺寸沿凹槽的纵向达到20μm,横向达到8μm。用电子探针扫描的区域有很小的变形,这使得人们可以使用该区域进行SEM校准。当使用能量为15 keV、探针电流为0.2 nA的初级电子时,凹槽横向倾斜壁的投影大小在七次扫描中不会改变。这使得人们可以使用MShPS-2.0Si测试对象进行多达1000次的SEM校准(一个点最多七次)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号