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首页> 外文期刊>Crystal growth & design >An In Situ and Real-Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buffer Effect at the Zinc/Alumina Interface
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An In Situ and Real-Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buffer Effect at the Zinc/Alumina Interface

机译：原位和实时等离子体方法的种子/粘附层：锌/氧化铝界面的铬缓冲效应

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摘要

The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that involve several elements. The study focuses on Cr at the Zn/alpha-Al2O3(0001) interface at 300 K. A particular interest of the present interface is that Zn does not stick at all on bare alumina. The sticking and morphology of both Cr and Zn films during their growth are analyzed from sub-monolayer to multilayer thicknesses. After an initial oxidation reaction with residual OH groups, shown to be detrimental to Zn adhesion, Cr growth proceeds through the formation of high aspect ratio particles that percolate around an average thickness of 10 A. With regard to Zn growth on a Cr deposit, two very distinct stages can be distinguished. In the sub-monolayer thickness range, Cr forms a seed layer that drastically increases the Zn sticking coefficient from 0 to nearly 1 due to a diffusion length of physisorbed Zn adatoms before desorption larger than Cr island separation; Zn clusters are anchored on the Cr seeds that they encapsulate, but their wetting behavior is dictated by the interaction with alumina. In a second stage, as soon as the Cr film percolates, it forms an adhesion layer on which Zn grows in a nearly two-dimensional mode. In all cases, Cr films are stable upon annealing. On Cr-covered alumina, the Zn desorption energy is enhanced as compared to bare surfaces, which, in line with atomistic simulations, is assigned to the formation of more favorable Cr-Al2O3 and Cr-Zn than Zn-Al2O3 bonds. Generally speaking, the ability demonstrated herein of small amounts of additives to dramatically increase the adhesion of films is of great practical interest. It shows that noncontinuous and partially oxidized films of additives, closer to realistic cases of application, can strongly enhance the sticking of films. Also, anchoring a functional film by discrete predeposited seeds can keep its properties intact.
机译：通过结合表面科学技术，在蒸发膜上原位和实时探索添加剂对金属/氧化物界面的影响，其中一种非常灵活的光学方法显示了独特的能力，可以仔细检查涉及多种元素的支撑团簇的生长和润湿性。这项研究的重点是300 K下Zn/alpha-Al2O3（0001）界面处的Cr。目前界面的一个特别有趣之处是，Zn根本不会粘附在裸氧化铝上。从亚单层到多层厚度，分析了Cr和Zn薄膜在生长过程中的粘附和形貌。在与残余OH基团发生初始氧化反应后，Cr生长通过形成高长径比颗粒进行，该颗粒的平均厚度为10 A。关于Cr沉积物上的Zn生长，可以区分两个非常不同的阶段。在亚单层厚度范围内，由于物理吸附的锌原子在解吸之前的扩散长度大于铬岛分离，铬形成了一个种子层，使锌粘附系数从0大幅增加到接近1；锌团簇固定在它们封装的铬晶种上，但它们的润湿行为取决于与氧化铝的相互作用。在第二阶段，一旦铬膜渗透，它就会形成一个附着层，锌在其上以接近二维的模式生长。在所有情况下，铬膜退火后都是稳定的。在铬覆盖的氧化铝上，与裸露表面相比，锌的脱附能增强，这与原子模拟一致，被认为是形成比锌-氧化铝键更有利的Cr-Al2O3和Cr-Zn键的原因。一般来说，本文证明的少量添加剂显著增加薄膜附着力的能力具有重大的实际意义。结果表明，添加剂的非连续和部分氧化膜更接近实际应用情况，可以显著增强膜的粘附性。此外，通过离散的预沉积种子锚定功能膜可以保持其性质完好无损。

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  • 来源
    《Crystal growth & design》 |2021年第6期|共12页
  • 作者

    Messaykeh Maya; Chenot Stephane; David Pascal; Cabailh Gregory; Jupille Jacques; Koltsov Alexey; Lazzari Remi;

  • 作者单位

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

    ArcelorMittal Maizieres Res F-57280 Maizieres Les Metz France;

    Sorbonne Univ CNRS UMR 7588 Inst NanoSci Paris F-75005 Paris France;

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  • 正文语种 eng
  • 中图分类 晶体学;
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