机译:基于Gasb / GaInassb / Gaalassb异质结构的P-I-N光电二极管的速度表征在1.9 mu m的前桥接触
Bauman Moscow State Tech Univ Sci &
Educ Ctr Photon &
IR Technol Moscow 105005 Russia;
Ioffe Inst St Petersburg 194021 Russia;
Ioffe Inst St Petersburg 194021 Russia;
Ioffe Inst St Petersburg 194021 Russia;
Bauman Moscow State Tech Univ Sci &
Educ Ctr Photon &
IR Technol Moscow 105005 Russia;
Aston Univ Aston Inst Photon Technol Birmingham B4 7ET W Midlands England;
Bauman Moscow State Tech Univ Sci &
Educ Ctr Photon &
IR Technol Moscow 105005 Russia;
Bauman Moscow State Tech Univ Sci &
Educ Ctr Photon &
IR Technol Moscow 105005 Russia;
Ioffe Inst St Petersburg 194021 Russia;
Bauman Moscow State Tech Univ Sci &
Educ Ctr Photon &
IR Technol Moscow 105005 Russia;
机译:基于GaSb / GaInAsSb / GaAlAsSb异质结构,传输频带为2-5 GHz的中红外光谱区1.2-2.4μm的高速光电二极管
机译:GaSb / GaInAsSb / GaAlAsSb光电二极管异质结构的湿法和干法蚀刻
机译:基于GaSb / GaInAsSb / AlGaAsSb双异质结构的低噪声光电二极管,光谱范围为1-4.8μm
机译:基于Gasb / GaInassb / Gaalassb异质结构的光电探测器的操作速度测量与前桥接触,用于检测波长为1.55和1.9μm的超短脉冲
机译:高速p-I-N中功率相转换的表征 光电二极管