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On the Role of Hydrogen Bonding in Gas-Phase S(N)2 Reactions at Silicon

机译:氢键合在硅(N)2中的氢键合中的作用

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( )The shape of the potential energy surface (PES) of gas-phase S(N)2 reactions at silicon is determined by the type of nucleophile, the leaving group, and substituents which remain bonded to silicon. In this study, we present PES scans along the reaction coordinate of six symmetrical S(N)2 reactions: X- + SiR3X -> XSiR3 + X-, where X = Cl or F and R = H, Me, or OMe. While the fluorine systems and the CISiH3Cl system only give single-well PESs, CISiMe3Cl and CISi(OMe)(3)Cl give triple- and double-well PESs with stable pre- and post-reaction complexes. A complementary bonding analysis (energy decomposition analysis, quantum theory of atoms in molecules, and natural bond orbitals) reveals that the leaving group (X-) is stabilized by hydrogen bonding in the XSiMe3X and XSi(OMe)(3)X systems. It is shown that this so far neglected stabilizing contribution, along with sigma-hole bonding, is responsible for the shapes of the PESs of ClSiMe3Cl and CISi(OMe)(3)Cl in the gas phase.
机译:()硅上气相S(N)2反应的势能面(PES)的形状取决于亲核基团的类型、留下的基团和仍然与硅结合的取代基。在这项研究中,我们沿着六个对称的S(N)2反应的反应坐标进行PES扫描:X-+SiR3X->XSiR3+X-,其中X=Cl或F,R=H,Me或OMe。而氟体系和CISiH3Cl体系只生成单阱PESs,而CISiMe3Cl和CISi(OMe)(3)Cl则生成具有稳定的反应前和反应后络合物的三阱和双阱PESs。互补键分析(能量分解分析、分子中原子的量子理论和自然键轨道)表明,离开基团(X-)在XSiMe3X和XSi(OMe)(3)X系统中通过氢键稳定。结果表明,这种迄今为止被忽视的稳定作用,以及sigma空穴键合,是导致气相中ClSiMe3Cl和CiI(OMe)(3)Cl的PES形状的原因。

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