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Dim and Dmoc Protecting Groups for Oligodeoxynucleotide Synthesis

机译:暗和Dmoc保护团体Oligodeoxynucleotide合成

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This protocol provides details for the preparation of nucleoside phos-phoramidites with 1,3-dithian-2-yl-methyl (Dim) and 1,3-dithian-2-yl-methoxycarbonyl (Dmoc) as protecting groups, and a linker with Dmoc as the cleavable function, then using them for solid phase synthesis of sensitive oligodeoxynucleotides (ODNs). Using these Dim-Dmoc phosphoramidites and Dmoc linker, ODN synthesis can be achieved under typical conditions using phosphoramidite chemistry with slight modifications, and ODN deprotection and cleavage can be achieved under mild conditions involving oxidation with sodium periodate at pH 4 followed by aniline at pH 8. Under the mild deprotection and cleavage conditions, many sensitive functional groups including but not limited to esters, thioesters, alkyl halides, N-aryl amides, and a-chloroamides—which cannot survive the basic and nucleophilic deprotection and cleavage conditions such as concentrated ammonium hydroxide and dilute potassium methoxide used in typical ODN synthesis technologies—can survive. Thus, it is expected that the Dim-Dmoc ODN synthesis technology will find applications in the synthesis of ODNs that contain a wide range of sensitive functional groups.
机译:本协议提供的细节准备的核苷phos-phoramidites1, 3-dithian-2-yl-methyl(暗)1, 3-dithian-2-yl-methoxycarbonyl (Dmoc)保护组,和与Dmoc作为链接器可分裂的函数,然后使用固体合成阶段的敏感oligodeoxynucleotides (ODNs)。Dim-Dmoc phosphoramidites Dmoc链接器,ODN合成可以在典型的实现用phosphoramidite化学条件轻微的修改,ODN去乳沟可以在温和的条件下实现涉及与高碘酸钠氧化pH值4其次是苯胺在pH值8。去和乳沟条件,很多敏感的官能团包括但不限于酯、硫代酸酯、卤代烃N-aryl酰胺,a-chloroamides-which不能生存的基本,亲核去和乳沟条件如集中氢氧化铵和稀甲醇钾在典型的ODN合成技术可以使用生存。ODN合成技术将应用程序ODNs包含广泛的合成一系列敏感的官能团。

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