• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Applied optics >Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system
【24h】

Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system

机译：Mo / Si多层涂层对极紫外光刻系统成像特性的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The role of Mo/Si reflective coatings in the imaging performance of an extreme-ultraviolet projection lithography system under polychromatic illumination has been theoretically examined. Using a thin-film computer model, we have explored various multilayer design criteria. Optimum operating conditions, leading to the maximum system transmittance, were found for a tuned multilayer system operating at lambda = 12.7 nm. In this configuration, Mo/Si coatings have been shown to be nondetrimental to the imaging performance of our system with the introduction of only minor modifications to the propagating wave front, which can be adequately described by a simple tilt and defocus term. (C) 1998 Optical Society of America. [References: 6]
机译：理论上已经研究了Mo / Si反射涂层在多色照明下的极紫外投影光刻系统的成像性能中的作用。使用薄膜计算机模型，我们探索了多种多层设计标准。对于在λ= 12.7 nm下工作的调谐多层系统，发现了导致最大系统透射率的最佳工作条件。在这种配置中，仅对传播波阵面进行了微小的修改，就可以证明Mo / Si涂层对我们系统的成像性能无害，这可以通过简单的倾斜和散焦术语来充分描述。 （C）1998年美国眼镜学会。 [参考：6]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号