Passive ridge waveguides can be deposited on silicon by a solvent-assisted lithographic process incorporating simple mask technology and photosensitive solgel-derived glasses. Thick films (similar to 4 mu m) are dip coated in one step, and channel waveguides and power splitters are imprinted in them by UV light through appropriate masks. Unexposed regions of the glass are removed by soaking of the films in n-propanol. The remaining ridges are then treated at 200 degrees C and planarized with a solgel cladding layer. Circular mode profiles are observed from ridge guides covered with the cladding. The waveguides are characterized with scanning electron microscopy, atomic force microscopy, surface profilometry, ellipsometry, and fiber end coupling. Overall, the procedure is simple and reproducible and leads to waveguides with low loss, of the order of 0.13 dB/cm. (C) 1998 Optical Society of America. [References: 21]
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机译：无源脊形波导可以通过溶剂辅助光刻工艺沉积在硅上，该工艺结合了简单的掩模技术和光敏溶胶凝胶玻璃。一步浸涂厚膜（大约4微米），然后通过适当的掩模用紫外线将通道波导和功率分配器压印在其中。通过将膜浸在正丙醇中除去玻璃的未曝光区域。然后在200摄氏度下处理剩余的脊线，并用溶胶凝胶覆层平面化。从覆盖有覆层的脊形导轨可以观察到圆形模式轮廓。波导的特征在于扫描电子显微镜，原子力显微镜，表面轮廓仪，椭圆仪和光纤末端耦合。总的来说，该过程是简单且可重复的，并且导致波导的损耗低，约为0.13 dB / cm。 （C）1998年美国眼镜学会。 [参考：21]
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