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Fractal and inertia moment analyses for thin-film quality monitoring

机译：Fractal and inertia moment analyses for thin-film quality monitoring

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The widespread applications of thin films in optronics demand innovative techniques for its characterizations. The work reported here proposes electronic speckle pattern interferometry and fractal-based methods for assessing the quality of thin films taking the industrially relevant molybdenum oxide (MoO3) incorporated niobium oxide (Nb2O5) films The films with different levels of MoO3 incorporation (1, 2, 3, 5, and 10 wt. %) are prepared by radio frequency sputtering. The study reveals the structure modifications of Nb2O5 from the orthorhombic to monoclinic phases with an associated morphological variation revealed through atomic force microscopy and field-emission scanning electron microscopy analyses. The films' specklegrams are recorded under thermal stress; the inertia moment (IM) and fractal analyses are computed and compared with the root-mean-square surface roughness of the films The lacunarity analysis of the AFM films agrees well with the specklegrams. Thus, the lower IM and lacunarity values of the specklegrams can be regarded as indicators of the good quality of thin films (C) 2022 Society of Photo-Optical Instrumentation Engineers (SPIE)
机译：薄膜在光电学中的广泛应用需要创新的表征技术。本文报道的工作提出了电子散斑图案干涉测量和基于分形的方法，用于评估薄膜的质量，采用工业相关的氧化钼（MoO3）掺入氧化铌（Nb2O5）薄膜通过射频溅射制备具有不同MoO3掺入水平（1、2、3、5和10重量%）的薄膜。该研究揭示了Nb2O5从斜交相到单斜相的结构修饰，并通过原子力显微镜和场发射扫描电子显微镜分析揭示了相关的形态变化。薄膜的散斑图是在热应力下记录的;计算了惯性矩（IM）和分形分析，并与薄膜的均方根表面粗糙度进行了比较，AFM薄膜的空隙分析与散斑图吻合较好。因此，散斑图的较低IM和空隙值可以被视为薄膜质量良好的指标（C） 2022年光电仪器工程师协会（SPIE）

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