Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

Zhaohui H. Yang; James R. Leger

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Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

机译：Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

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摘要

Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 (mu)m. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.

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来源
《Optical Engineering》 |2006年第4期|043401-1-043401-7-0|共7页
作者
Zhaohui H. Yang; James R. Leger;
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作者单位

University of Minnesota Department of Electrical 4-174EE/CSci Building 200 Union Street S.E Minneapolis, Minnesota 55455;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种英语
中图分类光学仪器;
关键词
electron-beam lithography; aspheric optics; phase conjugation; laser-beam shaping; vertical-cavity surface-emitting lasers;

Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

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