We review our recent progress on the fabrication of x-ray diffractive optical elements (DOEs) by combining complementary advantages of electron beam, x-ray, and proximity optical lithography. First, an electron beam lithography tool with an accelerating voltage of 100 kV is used to expose initial x-ray mask based on SiC membrane with a low aspect ratio. Second, x-ray lithography is used to replicate x-ray DOEs and amplify the aspect ratio up to 14:1. Third, proximity optical lithography is used to fabricate a large-scale gold mesh as the supporting structures. We demonstrate that this method can achieve high aspect ratio metal nanometer structures without the need of a complicated multilayer resist process. A large number of x-ray DOEs have been fabricated with feature sizes down to 100 nm for the purpose of laser plasma fusion applications. Among them, the ninth-order diffraction peak on the positive side of the zeroth order can be observed for both 3333 and 5000 lines/mm x-ray gold transmission gratings.
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