Plasmonic Photoresistor Based on Interconnected Metal-Semiconductor Grating

Anik Kumar Ghosh; Swagato Sarkar; Takuya TsudaSoosang ChaeAndre KnappMirko NitschkeAmit DasSven WiessnerTobias A. F. KoenigAndreas Fery

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Plasmonic Photoresistor Based on Interconnected Metal-Semiconductor Grating

机译：Plasmonic Photoresistor Based on Interconnected Metal-Semiconductor Grating

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Metal-semiconductor nanostructures in various configurations are extensivelyused in photodetection, photocatalysis, and photovoltaics. For photodetectionpurposes, the working principle is straightforward; on illumination,generated charge carriers in excess lead to a decrease in resistance. Notably,using an interconnected metal-semiconductor grating, it is observed andnow reported an opposite response, an increase in the resistance. Suchphotoresistors are fabricated through wrinkle structuring and oblique anglematerial deposition methods. It is found that the controlled wrinkling leadsto large-area 1D periodic structures with coexisting cracking perpendicularto the grating direction—such cracks are used as connections between thetwo-point contact measurement through the associated gold layer deposition.An enhanced current reduction is further observed on photoexcitation for anadditional deposition of an amorphous titania layer. Subsequently, a discussionon the mechanisms and interaction between hot electron injection,charge carrier recombination, and thermalization is presented. Supported bynumerical modeling, the angle-resolved plasmonic modes with the photoresistancecan be correlated. The ease of layered deposition of the materialsallows one to extend the studies on cavity-based structures with sandwichedtitania layers as hotspots. This simple, scalable, and robust fabricationmethod thus promises an efficient routeway toward photosensor developmentin which plasmon-mediated hot electrons play a crucial role.

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来源
《Advanced functional materials》 |2023年第23期|2210172.1-2210172.12|共12页
作者
Anik Kumar Ghosh; Swagato Sarkar; Takuya TsudaSoosang ChaeAndre KnappMirko NitschkeAmit DasSven WiessnerTobias A. F. KoenigAndreas Fery;
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Leibniz-Institut fuer Polymerforschung Dresden e.V. (IPF)Hohe Str. 6, 01069 Dresden, Germany;

Leibniz-Institut für Polymerforschung Dresden e.V. (IPF)Hohe Str. 6, 01069 Dresden, Germany Chair for Elastomeric MaterialsInstitute of Materials ScienceTechnische Universitaet DresdenHelmholtzstra?e 7, 01069 Dresden, Germany;

Leibniz-Institut für Polymerforschung Dresden e.V. (IPF)Hohe Str. 6, 01069 Dresden, Germany Center for Advancing Electronics Dresden (cfaed)Technische Universit?t DresdenHelmholtzstr. 18, 01069 Dresden, Germany Faculty of Chemistry and Food ChemistryTechnLeibniz-Institut für Polymerforschung Dresden e.V. (IPF)Hohe Str. 6, 01069 Dresden, Germany Center for Advancing Electronics Dresden (cfaed)Technische Universit?t DresdenHelmholtzstr. 18, 01069 Dresden, Germany Chair for Physical Chemistry of Polymeric Ma;

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正文语种英语
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diffraction gratings; photodetectors; photoresistors; plasmonics; wrinkles;

Plasmonic Photoresistor Based on Interconnected Metal-Semiconductor Grating

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