首页> 外文期刊>Optical and Quantum Electronics >Sub-micrometre dielectric and metallic yablonovite structures fabricated from resist templates
【24h】

Sub-micrometre dielectric and metallic yablonovite structures fabricated from resist templates

机译:Sub-micrometre dielectric and metallic yablonovite structures fabricated from resist templates

获取原文
获取原文并翻译 | 示例
           

摘要

This paper reports the optical characterisation and numerical simulations of sub-micrometre yablonovite templates fabricated in poly-methyl methacrylate (PMMA) resist along with the pattern transfer to metals and other dielectrics. The fabrication is based on three consecutive exposures to an X-ray beam through a triangular lattice of holes. Up to seven (111) crystal periods are repeatedly obtained in thick PMMA layers. Optical characterisations of 1.3 mum period templates show well-defined stop-bands in the mid-infrared, in good agreement with the numerical simulations. Two simple and low-cost methods are used to replicate the yablonovite structures in other materials. The pattern transfers to a metal (copper) and a high-refractive-index dielectric (titanium dioxide) are obtained by electrodeposition and a sol-gel technique, respectively. Very regular yablonovite-type metallic structures of 2 mum lattice constant and 4.3 mum height are fabricated with metallic wires of 500 nm diameter over a surface of similar to 150 x 150 mum(2). [References: 41]

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号