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Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

机译：Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

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摘要

UV-IR cutoff filters consisting a number of alternating layers of TiO{sub}2 and SiO{sub}2 were prepared by reactive electron-beam deposition (EBD) at a glass-substrate temperature of 300℃ and by reactive ionassisted deposition (IAD) at an ambient substrate temperature. All the filters were prepared in the same coater, equipped with two electron beam guns and one advanced plasma source. The uniformity and reproducibility of filters prepared by both techniques were investigated and compared, andcorrelated with results from single-layer materials. The useful sample radii, with optical thickness variation less than 1.6%, for EBD and IAD filters were up to 50 and 30 cm, respectively. The run-to-run reproducibility of EBD filters was as good as oreven better than that of IAD filters. However, the temperature stability of IAD filters was superior to that of EBD filters, which confirmed that the energetic ion bombardments made the component films denser.

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