首页> 外文期刊>Advanced functional materials >In-Memory Computing of Multilevel Ferroelectric Domain Wall Diodes at LiNbO_3 Interfaces
【24h】

In-Memory Computing of Multilevel Ferroelectric Domain Wall Diodes at LiNbO_3 Interfaces

机译:In-Memory Computing of Multilevel Ferroelectric Domain Wall Diodes at LiNbO_3 Interfaces

获取原文
获取原文并翻译 | 示例
           

摘要

Direct data processing in nonvolatile memories can enable area- andenergy-efficient computation, unlike independent performance betweenseparate processing and memory units; repetitive data transfer betweenthese units represents a fundamental performance limitation in moderncomputers. Spatially mobile conducting domain walls in ferroelectrics canbe redirected between drain, gate, and source electrodes to function asnonvolatile transistors with superior energy efficiency, ultrafast operatingand communication speeds, and high logic/storage densities. Here, inmemorycomputing is demonstrated using multilevel domain wall diodesat LiNbO_3 interfaces. Ultrathin domains within interfacial layers betweeneach mesa-like memory cell and the contact electrodes can rectify diodelikedomain wall currents with on/off current ratios exceeding 10~7 at lowoperating voltages, surpassing the performance of traditional p-n junctionsusing built-in potentials across depletion layers. NOT, NAND, and NORgate logic functions are demonstrated, providing insights into high-densityintegration of multilevel storage and computational units in all-ferroelectricdomain wall devices.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号