• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Advanced functional materials >Design of p-WSe_2/n-Ge Heterojunctions for High-Speed Broadband Photodetectors
【24h】

Design of p-WSe_2/n-Ge Heterojunctions for High-Speed Broadband Photodetectors

机译：Design of p-WSe_2/n-Ge Heterojunctions for High-Speed Broadband Photodetectors

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相关主题

摘要

Van der Waals (vdW) 2D/3D heterostructures are extensively studied for high-performance photodetector applications. Until now, the type of 2D materials has been the primary area of interest rather than the design of 3D semiconductors. In this study, high-speed broadband photodiodes (PDs) based on vdW p-WSe2/n-Ge heterojunctions are reported, and the performance compared with different n-Ge regions formed via the ion-implantation process. The fabricated PD with a typical long n-Ge region and low doping concentration responds to a broad spectral range from visible to infrared near 1550 nm with a response time of approximate to 3 mu s and responsivity of 1.3 A W-1. The inferior responsivity of PDs with short n-Ge regions can be improved as demonstrated by experimental results and process simulation. Density functional theory calculations are performed to estimate the variation of the energy band structures with the doping concentration of n-Ge. Fast photoresponse and efficient carrier separation across the heterojunction can be expected regardless of the n-Ge doping concentration. Based on the experimental results together with theoretical band structure and process simulation, it is shown that the heterojunction with an optimized n-Ge design is a promising high-speed broadband photodetector that can be implemented with complementary metal-oxide-semiconductor design and fabrication processes.

著录项

获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号