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首页> 外文期刊>Journal of Microelectromechanical Systems: A Joint IEEE and ASME Publication on Microstructures, Microactuators, Microsensors, and Microsystems >Critical Issues in MEMS Property Measurement and Variation Measured by Nanoindentation: Error Sources and Uncertainty
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Critical Issues in MEMS Property Measurement and Variation Measured by Nanoindentation: Error Sources and Uncertainty

机译:Critical Issues in MEMS Property Measurement and Variation Measured by Nanoindentation: Error Sources and Uncertainty

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摘要

A methodology has been developed for determining the uncertainty in the mechanical properties of metallic films, often used in suspended geometries in MEMS devices. The approach utilizes strategic sample preparation techniques and nanoindentation with Berkovich and cube corner probe geometries to determine hardness and elastic modulus. The approach is demonstrated on mechanically polished internal planes and as-fabricated faces of two different nickel MEMS devices. Issues specific to indentation of MEMS are reviewed and considered in applying the standard quasi-static nanoindentation technique to these devices, specifically edge proximity compliance, thin film on soft substrate effects, and surface roughness effects. Variability in the data in the form of coefficient of variation is used to quantify uncertainty of properties and as a comparison between the two types of devices. When proper considerations are taken, nanoindentation is an effective tool for extracting unknown mechanical properties and quantifying variation in suspended metal film systems. [2021-0122]

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