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Localized Geometry Determined Selectivity of Iodide-Derived Copper for Electrochemical CO_2 Reduction

机译:Localized Geometry Determined Selectivity of Iodide-Derived Copper for Electrochemical CO_2 Reduction

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摘要

Two iodide-derived copper (ID-Cu) electrocatalysts (E-ID-Cu and W-ID-Cu)are prepared by electrochemical/wet chemical iodination of Cu foil andsubsequent in situ electrochemical reduction reaction. In comparison toelectropolished Cu (EP-Cu), both E-ID-Cu and W-ID-Cu can produce multicarbon(C_(2+)) products with much-improved selectivity, with Faradic efficiency(FE) reaching 64.39% for E-ID-Cu and 71.16% for W-ID-Cu at ?1.1 V versusreversible hydrogen electrodes (RHE), which can be attributed to their localizedgeometry features with high defect density and high surface roughness.Given the well-determined FEs towards C_(2+) products, the partial current densitiesfor C_(2+) production can be estimated to be 251.8 mA cm~(?2) for E-ID-Cuand 290.0 mA cm~(?2) for W-ID-Cu at ?1.2 V versus RHE in a flow cell. In situcharacterizations and theoretical calculations reveal that the high-densitydefects and high surface roughness can promote *CO adsorption by raisingthe d band center and then facilitate C–C coupling, contributing to the highselectivity of C_(2+) products for ID-Cu. Interestingly, the high surface roughnesscan increase the residence time of *C–H intermediates and decreasethe formation energy of the *OCCO and*CH_3CH_2O intermediates, thusfavoring C_(2+) production, with a unique C_2H_6 product observed over W-ID-Cuwith FE of 10.14% at ?0.7 V versus RHE.

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