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首页> 外文期刊>Advanced functional materials >Facile and Fast Interfacial Engineering Using a Frustrated Interfacial Self-Assembly of Block Copolymers for Sub-10-nm Block Copolymer Nanopatterning
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Facile and Fast Interfacial Engineering Using a Frustrated Interfacial Self-Assembly of Block Copolymers for Sub-10-nm Block Copolymer Nanopatterning

机译：Facile and Fast Interfacial Engineering Using a Frustrated Interfacial Self-Assembly of Block Copolymers for Sub-10-nm Block Copolymer Nanopatterning

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摘要

A requisite for successful nanopatterning is a precise interface control tomeet the adequate surface energies. In block copolymer (BCP) nanopatterning,the interfaces need to be neutralized, promoting both blocks towet the substrate, and thus realizing the perpendicular orientation of BCPs.However, conventional methods for surface neutralization are expensive andrequire complex multi-step processes, which hinders the application of BCPto continuous lithography processes. In this study, the simplest method forcontrolling the out-of-plane domain orientation using frustrated interfacialself-assembly (FISA) of BCPs is introduced. The FISA layer is a randomly segregatedstructure that is readily created from the air/water interface. The FISAlayer can be transferred to any target substrate, neutralizing both free andsubstrate interfaces. Employing FISA, the highly aligned and perpendicularlyoriented sub-10-nm BCP patterns are produced with exceptional simplicity.

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