The thin SmS films obtained by magnetron sputtering of a SmS target with the 1.3Sm:1S composition have been investigated. The microanalysis of the sputtered target has been carried out and the distribution of elements in the film has been examined. It is shown that, with the magnetron used and a target 40 mm in diameter, the composition of the deposited film at a distance of similar to 13 mm from its edge corresponds to that of the sputtered target, located above the erosion zone. In the rest regions, this correspondence is absent. The dependence of the deposited film thickness on the distance to the magnetron has been investigated. It is demonstrated that a uniform film thickness of similar to 0.43 mu m is obtained in the region located above the target erosion zone during sputtering. A thickness gradient is observed in the rest regions of the film.
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