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Oxide/Halide/Oxide Architecture for High Performance Semi-Transparent Perovskite Solar Cells

机译：Oxide/Halide/Oxide Architecture for High Performance Semi-Transparent Perovskite Solar Cells

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摘要

A device architecture with n-type oxide/perovskite halide/p-type oxide forthe sputtering damage-free semi-transparent perovskite solar cells (PSCs) isreported. A p-type nickel oxide (NiO_x) nanoparticle overlayer on a perovskitelayer is introduced to act as both a hole transporting layer and buffer layer toavoid sputtering damage during deposition of transparent conducting oxide.The NiO_x based semi-transparent PSCs exhibit superior durability underharsh sputtering conditions such as high temperature and sputtering power,enabling the high quality of transparent electrodes. With optimal sputteringcondition for tin-doped indium oxide (ITO) as a top transparent electrode,the semi-transparent device shows an enhanced power conversion efficiency(PCE) of 19.5% (20.5% with a back reflector), which is higher than that of theopaque device (19.2%). The semi-transparent devices also shows superiorstorage stability without encapsulation under 10% relative humidity, retainingover 90% of initial PCE for 1000 h. By controlling the molar concentration ofperovskite solution, a semi-transparent PSC with a PCE of 12.8%, showing ahigh average visible transmittance (AVT) of 30.3%, is fabricated. The authorsbelieve that this architecture with n-type oxide/perovskite halide/p-type oxiderepresents a cornerstone for the high performance and commercialization ofsemi-transparent PSCs.

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