Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Scott M. Lewis; Guy A. DeRose; Hayden R. AltyMatthew S. HuntNathan LeeJames A. MannRichard GrindellAlex WertheimLucia De RoseAntonio FernandezChristopher A. MurynGeorge F. S. WhiteheadGrigore A. TimcoAxel SchererRichard E. P. Winpenny

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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

机译：Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

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A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.

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《Advanced functional materials》 |2022年第32期|2202710.1-2202710.10|共10页
作者
Scott M. Lewis; Guy A. DeRose; Hayden R. AltyMatthew S. HuntNathan LeeJames A. MannRichard GrindellAlex WertheimLucia De RoseAntonio FernandezChristopher A. MurynGeorge F. S. WhiteheadGrigore A. TimcoAxel SchererRichard E. P. Winpenny;
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Department of Chemistry and Photon Science Institute The University of Manchester Oxford Road, Manchester M13 9PL, UK,The Kavli Nanoscience Institute California Institute of Technology 1200 East California Boulevard, 107 – 81, Pasadena, CA 91125, USA,Sci-;

The Kavli Nanoscience Institute California Institute of Technology 1200 East California Boulevard, 107 – 81, Pasadena, CA 91125, USA;

Department of Chemistry and Photon Science Institute The University of Manchester Oxford Road, Manchester M13 9PL, UKSci-Tron Ltd 34 High Street, Aldridge, Walsall WS9 8LZ, UKDepartment of Chemistry and Photon Science Institute The University of Manchester Oxford Road, Manchester M13 9PL, UK,Sci-Tron Ltd 34 High Street, Aldridge, Walsall WS9 8LZ, UK;

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正文语种英语
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3D Monte Carlo Simulation; electron beam lithography; metal–organic electron beam resists;

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

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