On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

Mark Mero; Benjamin Clapp; Jayesh C. JasaparaWolfgang RudolphDetlev RistauKai StarkeJorg KrugerSven MartinWolfgang Kautek

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On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

机译：On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

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The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta_(2)O_(5) film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO_(2), HfO_(2), Al_(2)O_(3), and SiO_(2) films. A theoretical model is presented that explains these findings.

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来源
《Optical Engineering》 |2005年第5期|051107-1-051107-7-0|共7页
作者
Mark Mero; Benjamin Clapp; Jayesh C. JasaparaWolfgang RudolphDetlev RistauKai StarkeJorg KrugerSven MartinWolfgang Kautek;
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作者单位

University of New Mexico Department of Physics and Astronomy Albuquerque, New Mexico 87131;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种英语
中图分类光学仪器;
关键词
laser-induced damage; laser materials; ultrafast phenomena; coatings;

On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

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