Role of nano-precursors in ultraviolet-laser damage of HfO_2/SiO_2 mixture coatings

Zhou Qiang; Ma Ping; Qiu FumingPu YuntiQiao ZhaoLv LiangZhang MingxiaoKong PengfeiQiu RongJiang Yong

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Role of nano-precursors in ultraviolet-laser damage of HfO_2/SiO_2 mixture coatings

机译：Role of nano-precursors in ultraviolet-laser damage of HfO_2/SiO_2 mixture coatings

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Several series of HfO2/SiO2 mixture coatings with different mixture ratios were prepared via ion beam sputtering. The physical properties of the coatings were measured, and the damage characteristics induced by nanoprecursors in each of HfO2/SiO2 mixture coatings were investigated. The number of microscale pits induced by nano-precursors decreased while passing from pure SiO2 towards the HfO2/SiO2 system, and melted regions became significant at HfO2 concentrations above 50. Some damage microscale pits induced by nano-precursors exhibited cracks perpendicular to the laser polarization, and laser-induced periodic surface structures were formed under higher fluences and about 75 of HfO2. The damage morphology patterns revealed that the damage mechanisms were dominated by the nano-precursors in the subsurface layers and various thermal adsorption characteristics of the mixture coatings.

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来源
《Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films》 |2021年第1期|138963.1-138963.8|共8页
作者
Zhou Qiang; Ma Ping; Qiu FumingPu YuntiQiao ZhaoLv LiangZhang MingxiaoKong PengfeiQiu RongJiang Yong;
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作者单位

China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China|Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Sichuan, Peoples R China;

China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China;

Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Sichuan, Peoples R China;

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正文语种英语
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Laser-induced damage; Hafnium dioxide; Silicon dioxide; Microscale pits; Periodic surface structures; Ion beam sputtering;

Role of nano-precursors in ultraviolet-laser damage of HfO_2/SiO_2 mixture coatings

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