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首页> 外文期刊>Journal of Materials Research >Physical and electrochemical characteristics of NiFe2O4 thin films as functions of precursor solution concentration
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Physical and electrochemical characteristics of NiFe2O4 thin films as functions of precursor solution concentration

机译：Physical and electrochemical characteristics of NiFe2O4 thin films as functions of precursor solution concentration

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摘要

The effects of the precursor solution concentration on the physical and electrochemical characteristics of NiFe2O4 films were studied. XRD patterns confirmed the formation of a spinel cubic crystal structure. FE-SEM images showed a mesoporous morphology. EDAX analysis confirmed a nearly stoichiometric deposition. Optical absorption studies confirmed the direct bandgap energies in the range 2.00-2.27 eV. The films deposited with a 0.25 M solution concentration had the minimum room-temperature electrical resistivity (3.39x 10(3) Omega cm). Films deposited with a 0.15 M solution had the maximum specific capacitance values, 591 F g(-1) at a scan rate of 5 mV s(-1) (CV) and 632 F g(-1) at a current density of 0.5 A (GCD). NiFe2O4 films exhibited specific energy and specific power values of 15.22 W h kg(-1) and 225 W kg(-1), respectively, at a current density of 1 A g(-1). Further, these films retained 92.97 of their specific capacitance after 1000 continuous cycles.

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