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Synchronous measurement of surface deformation and gradient distribution in microstructures

机译:Synchronous measurement of surface deformation and gradient distribution in microstructures

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摘要

In the traditional microfield speckle pattern interference measurement system, due to the use of high-magnification objective lens, the working distance is small and the shearing device cannot be introduced to implement shearography measurement. Thus the distribution of the deformation gradient on a microstructure surface cannot be measured. A system for the synchronous measurement of the surface deformation and gradient distribution of a microstructure was designed. Through the combination of focusing lens, convex lens, and low-magnification objective lens, the microstructure surface was clearly magnified and the internal distance of the system was enlarged. Thus the shearing device can be introduced to realize the shearography measurement under the microfield view. The synchronous full-field measurement of the structural surface deformation and its gradient distribution was further realized by the introduction of a reference light and designing of an optical path switch. In addition, the designed system had a zoom feature, which can facilitate the measurement in variable field of view in a certain range. The feasibility of the system was verified by theoretical analysis and experiment, and the practicability was validated by testing the chip and circuit board.

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