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首页> 外文期刊>Journal of Applied Polymer Science >Molecular structure development in silsesquioxane-urethane thin film hybrids: A small-angle neutron scattering investigation
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Molecular structure development in silsesquioxane-urethane thin film hybrids: A small-angle neutron scattering investigation

机译：Molecular structure development in silsesquioxane-urethane thin film hybrids: A small-angle neutron scattering investigation

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The small-angle neutron scattering (SANS) technique was used to investigate the molecular structure in situ of the synthesis of a series of polyhedral oligomeric silsesquioxane (POSS)-based polyurethane hybrid materials with respect to the reaction time, and the hybridization chemistry. In order to tailor the material properties for application in thin film coatings of metal surfaces, the effect on the hybrid structure was investigated of a selected end-capping agent (silaneN-ethyl-3-trimethoxysilyl-2-methylpropanamine; A-Link35) and chain extension agent (polyethylene glycol-ran-propylene glycol). The structure of the POSS-urethane hybrid in solution was observed to vary between fully or partially solvated polymer chains (radius of gyration R-g similar to 20-40 angstrom), and larger collapsed structures (R-g >100's angstrom). (c) 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2019, 137, 48772.

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