AbstractThin polymer films were produced from methyl‐,n‐propyl‐, allyl‐, and phenyl isothiocyanates in an RF plasma, induced in an electrodeless flow system. The deposition rate of polymer film as well as its composition was found to be dependent on the substrate position in the reactor tube. The distinct effect of the monomer structure and the monomer saturated vapor pressure on the polymer deposition rate suggest a molecular nature for the plasma polymerization process and an important role for adsorption in the deposition process, respectively. The surface free energy data, evaluated by contact angel measurements, reveal the polar character of the organoisothiocyanate plasma polymers. The polar component of the surface appears to increase with the sulfur concentration in the polym
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