A liquid metal sputtering system equipped with a SiO_2 reservoir and a radio frequency (RF) power supply has been designed and built to minimize possible contamination due to sputtering from any materials other than the target material. An electrode fitted with cylindrical and toroidal magnets was designed and mounted at the bottom of the spherical glass chamber in order to confine the discharge near the target and enhance the ionization efficiency. The inductively coupled plasma configuration exhibited good coupling of the RF power to the gas discharge sustained at low gas pressures and high RF powers. Liquid gallium suspended upon the chamber bottom was confirmed sputtered by the surrounding plasma by a quadrupole mass analyzer. Electron temperature (T_e) was estimated from the optical emission lines under the local thermodynamic equilibrium (LTE) approximation.
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