We report the design, construction and performance of a versatile substrate heater that meets the severe design constraints of heating substrates to high temperatures (le;900thinsp;deg;C) in relatively high pressures (hundreds of Torr) of oxidizing gases. The heater has been used to heat substrates by both thermal conduction via a conductive high temperature cement and by direct radiation. In particular, the production of highhyphen;quality YBa2Cu3O7minus;dgr;thin films grown on radiatively heated LaAlO3substrates is demonstrated using the pulsed laser deposition (PLD) technique.
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