On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films

Peponas  S; Guedda  M; Benlahsen  M

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On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films

机译：On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films

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The analysis of post-contamination effect on delamination of amorphous carbon nitride (a-CNx) films deposited by RF magnetron sputtering of a graphite target in pure nitrogen plasma. Combined atomic force microscopy (AFM) and Fourier Transform Infrared (FTIR) measurements are used to fully characterise the films. Various shapes of debonding patterns, such as straight-sided blisters or worm-like structures, have been observed. The microstructure analysis revealed the porous character of the films and their post-deposition contamination by oxygen and water. The observed delamination of the films results from high residual compressive stresses created during diffusion and chemical reaction of water at the film/substrate interface through the porosities, possibly accompanied by volume expansion which support delamination crack advance. (c) 2008 Elsevier Ltd. All rights reserved.

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《Solid State Communications》 |2008年第2期|78-82|共5页
作者
Peponas S; Guedda M; Benlahsen M;
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作者单位

Fac Sci Amiens, Phys Mat Condensee Lab, F-80039 Amiens 2, France;

CNRS, UMR 6140, LAMFA, F-75700 Paris, France;

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原文格式 PDF
正文语种英语
中图分类固体物理学;
关键词
thin films; surfaces and interfaces; mechanical properties; strain; high pressure; ATOMIC-FORCE MICROSCOPY; COMPRESSED THIN-FILMS; PLASMA PARAMETERS; CNX FILMS; GROWTH; MICROSTRUCTURE; STABILITY; ADHESION; NITROGEN; RAMAN;

On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films

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