首页> 外文期刊>journal of applied polymer science >Topographic orientation on buffed polymeric substrates: The mechanism of wax buffing
【24h】

Topographic orientation on buffed polymeric substrates: The mechanism of wax buffing

机译:Topographic orientation on buffed polymeric substrates: The mechanism of wax buffing

获取原文
           

摘要

AbstractThis paper reports on the observation that buffed waxy polymers control the orientation of a vapor‐deposited material subsequently deposited thereon. The insight into the mechanism of the buffing process of waxy polycrystalline polymers that these observations provide is presented. When a polycrystalline waxy polymer is buffed, grooves are formed. The dimensions of the grooves on the waxy polymer surface are substantially finer than the dimensions of the fibers of the buffing cloth. It is proposed that the buffing process stretches the polymer sufficiently to cause fibrillation, which results in the fine grooves observed. The fine grooves provide the topography necessary for orientation of the material deposited thereo

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号