The performance of Pt bottom electrode and PZT films deposited on Al2O3/Si substrate by using LaNiO3 film as an adhesion layer

Guo  YP; Akai  D; Sawada  KIshida  M

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The performance of Pt bottom electrode and PZT films deposited on Al2O3/Si substrate by using LaNiO3 film as an adhesion layer

机译：The performance of Pt bottom electrode and PZT films deposited on Al2O3/Si substrate by using LaNiO3 film as an adhesion layer

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摘要

A (110) preferred Pt electrode by using a (100)-oriented conductive oxide electrode LaNiO3 film as an adhesion layer on a gamma-Al2O3 (100)/Si substrate has been deposited by RF magnetron sputtering. It was found that the phase instability of LaNiO3 almost has no effect on the (110)orientated Pt growth. Highly (110)-textured Pb(Zr0.40Ti0.60)O-3 films can been achieved when it was deposited on the (110) preferred Pt bottom electrode. The as-grown Pb(Zr0.40Ti0.60)O-3 films possesses excellent dielectric, ferroelectric and pyroelectric properties. The results indicate that the Pt/LNO/gamma-Al2O3/Si substrate is attractive for depositing highly (110)-orientated ferroelectric films with perovskite structure and the highly (110)-orientated Pb(Zr0.4Ti0.60)O-3 films are promising for sensor and actuator applications. (C) 2007 Elsevier Ltd. All rights reserved.

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来源
《Solid State Communications》 |2008年第8期|413-417|共5页
作者
Guo YP; Akai D; Sawada KIshida M;
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作者单位

Shanghai Jiao Tong Univ, State Key Lab MMCs, Shanghai 200030, Peoples R China;

Toyohashi Univ Technol, Venture Business Lab, Toyohashi, Aichi, Japan;

Toyohashi Univ Technol, Dept Elect & Elect Engn, Toyohashi, Aichi 4418580, Japan;

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原文格式 PDF
正文语种英语
中图分类固体物理学;
关键词
PZT; chemical solution deposition; (110)-oriented; ferroelectricity; CHEMICAL-VAPOR-DEPOSITION; PB(ZR; TI)O-3 THIN-FILMS; PULSED-LASER DEPOSITION; FERROELECTRIC PROPERTIES; EPITAXIAL AL2O3; SI; FABRICATION; ORIENTATION; ACTUATORS; GROWTH;

The performance of Pt bottom electrode and PZT films deposited on Al2O3/Si substrate by using LaNiO3 film as an adhesion layer

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