AbstractA series of new light‐sensitive polysulfonate copolymers have been prepared by the interfacial polycondensation of mixed bisphenols and aromatic disulfonyl chlorides. The light‐sensitivity bisphenols contain the styryl ketone group. These polymers exhibit good light sensitivity, and upon exposure to light they crosslink and harden to give alkali‐ and acid‐resistant materials which are useful in photoresist appli
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