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Evaluation of Atomic Layer Stacking Structure and Curie Temperature of Magnetic Films for Thermally Assisted Recording Media (Invited)

机译:Evaluation of Atomic Layer Stacking Structure and Curie Temperature of Magnetic Films for Thermally Assisted Recording Media (Invited)

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摘要

Thermally assisted recording system is a promising candidate to overcome the trilemma of perpendicular magnetic recording hard disk drive development. In this paper, we introduce our current research about evaluation for the media material. In-plane X-ray diffraction technique is effective to evaluate atomic layer stacking structure of (111)-oriented face-centered cubic, c-plane-oriented hexagonal closed packed (hcp), and their intermediate structure with stacking faults of CoPt alloy thin film. Analytical results of Co_(50)Pt_(50)-based thin film shows that changing the valence electron number closer to 9 can effectively reduce the stacking fault. In practical, perfect hcp atomic layer stacking can be achieved by substituting Pt (group 10) with Rh (group 9). High-angle annular dark field of scanning transmission electron microscopy with probe diameter of 1 A can effectively observe composition modulated atomic layer stacking with the super-lattice diffraction in Co-based alloy films. In practical, for Co_(80)M_(20) (M: Ir, Pt) thin film sputtered under high substrate temperature, the irregular or alternately layered structure of M rich and M poor layer can be observed directly. To evaluate Curie temperature (T_C), which is an important physical property of thermally assisted media, conduction electron spin-dependent scattering should be the focus. Fitting dielectric spectra for MnSb thin film with T_C ~ 320 ℃ measured with the ellipsometry and analyzing the Drude's term, temperature dependence of resistivity and scattering time at around T_C was confirmed.

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  • 来源
    《IEEE Transactions on Magnetics》 |2014年第1期|3201205-1-3201205-5|共5页
  • 作者单位

    Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;

    New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan;

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  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 计量学;
  • 关键词

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