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Holographic characterization of epoxy resins at 351.1 nm

机译:Holographic characterization of epoxy resins at 351.1 nm

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摘要

The optical characteristics of two commercially available UV curable epoxy resins are investigatedusing nondegenerate four-wave mixing. The materials assessed are optimized for use with a UVargonion laser. The holographic gratings were written at a wavelength ofλ = 351.1 nm for anirradiance range 0.5 to 3.0 W/cm{sup}2 and read at λ =632.8 nm to compare the reactivity, curingspeed, shrinkage, and resolution of the resins. These experiments were carried out to prove thesuitability of the photopolymerization systems for microstereolithography.

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