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机译:Suppression of Void Formation in Si0.5Ge0.5 Alloy Nanowire during Ni Germanosilicidation
Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore;
ASTAR, Inst Microelect, Singapore 117685, Singapore;
SAINT SKKU Adv Inst Nanotechnol, Suwon 440746, Gyeonggi Do, South Korea;