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Six-axis controlled nanometer-order positioning stage for microfabrication

机译:Six-axis controlled nanometer-order positioning stage for microfabrication

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摘要

A compact, low-height prototype of a six-axis precise positioning stage for microfabrication has been developed. X and Y stage positioning requires nanometer positioning resolution and robustness against atmospheric turbulence. The stiffness and dead play of the traveling mechanism were improved by using rolling contact guides, and the positioning resolution was improved by using a friction drive mechanism. Analog signals from an optical linear scale are influenced little by atmospheric turbulence. Using these advantages of the optical linear scale and with a newly developed positioning algorithm, one-nanometer resolution was obtained.

著录项

  • 来源
    《nanotechnology》 |1992年第1期|21-28|共页
  • 作者

    T Nomura; R Suzuki;

  • 作者单位

    Manuf. Eng. Res. Center, Toshiba Corp., Yokohama, Japan;

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  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
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