The concept of an 'all-excimer' ultrafast high-power UV laser system implementing the KrF excimer medium both in the oscillator and in the amplifiers is presented. The system includes a short-pulse (10(-11)-10(-10) s) KrF oscillator employing fast pulse period Q-switching or truncated Brillouin scattering and a multipass KrF amplifier with a multilayer saturable absorber applied as a highly effective pulse compressor. By means of computer simulations, it is shown that the system, incorporating currently available KrF discharge modules and acridine dye as the saturable absorber, is capable of generating high-contrast pico- or subpicosecond pulses of near terawatt power level. References: 21
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