Diagnosis of the Argon Plasma in a PECVD Coating Machine

Wang  Q; Ba  DC; Feng  J

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Diagnosis of the Argon Plasma in a PECVD Coating Machine

机译：Diagnosis of the Argon Plasma in a PECVD Coating Machine

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摘要

A Langmuir probe plasma diagnostic system was developed to measure the plasma parameters in a PECVD vacuum coating machine. The plasma was a capacitively coupled plasma (CCP) driven by a radio-frequency (RF) power supply. To avoid the disturbance of radio-frequency field on the Langmuir probe measurement, a passive compensation method was applied. This method allowed the 'dc' component to be passed and measured in the probe circuit. It was found that the electron temperature in the range from 2.7 eV to 6.4 eV decreased with the increase in RF power. The measured plasma density ranged from 8 x 10(16) m(-3) to 0.85 x 10(15) m-3 and increased with the increase in RF power.

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来源
《Plasma Science & Technology》 |2008年第6期|727-730|共4页
作者
Wang Q; Ba DC; Feng J;
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作者单位

[Wang, Q;

Ba, DC] Northeastern Univ, Sch Mech Engn & Automat, Shenyang 110004, Peoples R China;

[Feng, J] Northeastern Univ, Coll Informat Sci & Engn, Shenyang 110004, Peoples R China;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种英语
中图分类物理学;
关键词
PECVD; coating machine; plasma diagnostics; Langmuir probe; PROBE;

Diagnosis of the Argon Plasma in a PECVD Coating Machine

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