Titanium oxide thin films were deposited by a DC sputtering technique onto unheated quartz substrates. X-ray diffraction (XRD) studies revealed an amorphous structure of the films. After heat treatment in air at different annealing temperatures (673, 873 and 1173K) for a certain time (12, 2 and 3 h), the film structure becomes polycrystalline with mixed anatase and ruffle phases. The morphology and the weight percentage of the phases strongly depend on the annealing conditions. With the increase of heat-treatment temperature till 1173 K, the weight percentage of rutile phase increases, being of 75 percent. As a consequence of changes in the structure and morphology of the studied films, the optical properties (refractive index, extinction coefficient, optical energy gap) change too.
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