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Sensitivity and sensitization mechanism of halomethylated polystyrene to near UV region

机译:Sensitivity and sensitization mechanism of halomethylated polystyrene to near UV region

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AbstractBromo‐ and chloromethylated polystyrene (BCMS) prepared for an X‐ray resist was sensitized to near UV region by addition of some sensitizers. Among them, 2,4‐diisopentylthioxanthone (DITX) and Michler's ketone were found to be efficient sensitizers for BCMS and related polymers under irradiation with a high pressure mercury lamp. To investigate the sensitization mechanism, IR and UV spectra were measured with the BCMS/DITX system under light irradiation. From the results, together with those of oxygen and radical scavenging effects on sensitivity of the polymer, it was suggested that hydrogen abstraction of the triplet state of DITX from the polymer induces photocrosslinking between the polymer c

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