Tunable surface plasmons interference patterns with the same mask in nanolithography

Xia Wan; Qingkang Wang; Haihua Tao

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Tunable surface plasmons interference patterns with the same mask in nanolithography

机译：Tunable surface plasmons interference patterns with the same mask in nanolithography

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摘要

When a transverse magnetic-polarized beam illuminates normally on an Ag grating mask with sub-wavelength slits, the surface plasmon (SP) interference patterns are formed on the Ag surface. According to the dispersion relationship of SPs, the wavelength of SPs ((lambda)_(sp)) is tunable by altering the refractive index of the photoresist or the illumination wavelength. Various (lambda)_(sp) form interference patterns with different size. The interference patterns are tunable using the same mask with period microns in size, which can save the cost of fabricating a different mask. This method will have potential applications to nanolithography.

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来源
《Optical Engineering》 |2012年第2期|028001-1-028001-4|共4页
作者
Xia Wan; Qingkang Wang; Haihua Tao;
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作者单位

Shanghai Jiao Tong University, Research Institute of Micro/Nano Science and Technology Shanghai, 200240, China;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种英语
中图分类计量学;
关键词
surface plasmon; nanolithography; interference; tunable pattern;

Tunable surface plasmons interference patterns with the same mask in nanolithography

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