One-dimensional Wolter optics with a sub-50 nm spatial resolution

S. Matsuyama; T. Wakioka; N. KidaniT. KimuraH. MimuraY. SanoY. NishinoM. YabashiK. TamasakuT. IshikawaK. Yamauchi

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One-dimensional Wolter optics with a sub-50 nm spatial resolution

机译：具有低于 50 nm 空间分辨率的一维 Wolter 光学器件

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摘要

We studied an imaging system consisting of an elliptical mirror and a hyperbolic mirror i.e., one-dimensional (1D) Wolter optics to realize an achromatic full-field hard x-ray microscopy with a resolution better than 50 nm. We report the performance of this 1D Wolter optical system when the mirrors were ultraprecisely figured by elastic emission machining. Experiments to form a demagnified image (demagnification factor of 385) of a 10 (mu)m slit were conducted at an x-ray energy of 11.5 keV at BL29XUL of SPring-8. The system could form a demagnified image with a resolution better than 50 nm over a 12.1 (mu)m field.

机译：我们研究了一种由椭圆镜和双曲镜（即一维（1D） Wolter 光学元件）组成的成像系统，以实现分辨率优于 50 nm 的消色差全场硬 X 射线显微镜。我们报告了这种一维Wolter光学系统在通过弹性发射加工超精确地计算反射镜时的性能。在SPring-8 BL29XUL下，在11.5 keV的X射线能量下，以形成10（μ）m狭缝的放大图像（放大倍数为385）的实验。该系统可以在12.1（μ）m的视场上形成分辨率优于50 nm的放大图像。

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来源
《Optics Letters》 |2010年第21期|3583-3585|共3页
作者
S. Matsuyama; T. Wakioka; N. KidaniT. KimuraH. MimuraY. SanoY. NishinoM. YabashiK. TamasakuT. IshikawaK. Yamauchi;
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作者单位

Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan;

Research Institute for Electronic Science, Hokkaido University, Kita 21 Nishi 10, Kita-ku, Sapporo 001-0021, Japan;

RIKEN/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan;

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正文语种英语
中图分类计量学;
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One-dimensional Wolter optics with a sub-50 nm spatial resolution

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