For the injection of a lowhyphen;current (100 mgr;A) highhyphen;brightness ion beam into an EBIS for subsequent ionization to very highhyphen;charge states, we have constructed a buckethyphen;type ion source with the following specific features: a) microwave discharge plasma generator for long lifetime, b) isolated end flanges to allow for versatile ion species production by sputtering, c) SmCo magnets in 90deg; easyhyphen;axis rotation for the magnetic cusp fields, and d) large diameter for reduction of gas load to the UHV beamline of the EBIS. The extraction system has been optimized for maximum brilliance at an emission current density of about 2 mA/cm2. The extraction electrode consists of a spent washer of the sputtered material and of the longhyphen;lasting complex shaped main part. The design provides almost unchanged extraction optics until the washer is sputtered away.
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