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>High critical current density obtained by focused ion beam patterning of high temperature superconducting thin films
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High critical current density obtained by focused ion beam patterning of high temperature superconducting thin films
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机译：High critical current density obtained by focused ion beam patterning of high temperature superconducting thin films
In an attempt to pattern microbridges in a superconducting line by focused ion beam milling, we have obtained a very high critical current density: 6 times; 108A/cm2at 77 K. Direct focused ion milling leads to microbridge structures as narrow as 200 nm. Ultrahigh current densities have already been reported by H. Jiang lsqb;Phys. Rev. Lett.66, 1785 (1991)rsqb; in such lsquo;lsquo;nanobridges.rsquo;rsquo; We have also measured sizehyphen;dependent critical current densities. We take into account the electrical field criterion and give a very simple interpretation of our experimental results based on the possibility of strong pinning in a very narrow bridge and the inhomogeneity of our films at a submicronic scale.
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